Magnetron Sputtering System for Batch Production
| Place of Origin:China Beijing |
Online Postings: Products , Selling Leads
Country/Territory: China
Business Type: Trading Company, Business Service (Transportation, finance, travel, Ads, etc)
Number of Employees: 11 - 50 People
Magnetron Sputtering System have many magnetron cathode targets and difference kinds which can suitable for difference size and shape of workpiece. Every parameter has large range. The film can be metal, alloy, compounds; also can be single layer or multi layers.
Parameter
Item | JPGF-400 | JPGF-450 |
Chamber size(diameter×height )mm | φ400×250 | φ450×270 |
Sputtering direction | Down to up or up to down | |
Ultimate pressure | ≤7×10-5Pa | ≤7×10-5Pa |
Pumping speed | From 1×105Pa to 5×10-3 Pa≤15min(7×10-4 Pa≤40min) | From 1×105Pa to 5×10-3 Pa≤15min(7×10-4 Pa≤40min) |
Vacuum system | Molecular pump | Molecular pump |
Target | 3sets φ60mm | 3sets φ80mm |
Target power | 1set DC 1set RF | 1set DC 1set RF |
Substrate rotation | 5~25r/min, | 5~30r/min, |
Baking temperature | Room temperature to 3000C adjustable | Room temperature to 3000C adjustable |
Gas control | 1set MFC,1set automatic pressure controller | 1set MFC,1set automatic pressure controller |
Power | 3 phase 9kW | 3 phase 11kW |
Magnetron Sputtering System for Batch Production
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Contact Us
Beijing JDK Electric Equipment Business Center
[China]
Street Address : guangshun north street
City : beijing
Province/State : Beijing
Country/Region : China
